Three-Mask Fabrication and Optimized Design of First-Level Free-Standing Interconnect for Microelectronics Application

Three-Mask Fabrication and Optimized Design of First-Level Free-Standing Interconnect for Microelectronics Application

Zhu, Q.
american society of mechanical engineers, electronic and photonic packaging, epp 2003 Vol. 3 pp. 171-182
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zhu2003threemaskamerican

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