Dramatic impact of pressure and annealing temperature on the properties of sputtered ferroelectric HZO layers

Dramatic impact of pressure and annealing temperature on the properties of sputtered ferroelectric HZO layers

Bouaziz, J.
apl materials 2019 Vol. 7 pp. 0-0
212
bouaziz2019dramaticapl

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44366
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10.1063/1.5110894
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