Reflectance of VUV-sensitive SiPM surfaces in liquid xenon

Reflectance of VUV-sensitive SiPM surfaces in liquid xenon

Michael Wagenpfeil,Tobias Ziegler,Alexander Fieguth,Judith Schneider,Thilo Michel,Christian Weinheimer;Michael Wagenpfeil;Tobias Ziegler;Alexander Fieguth;Judith Schneider;Thilo Michel;Christian Weinheimer;
nuclear instruments and methods in physics research section a: accelerators, spectrometers, detectors and associated equipment 2019 Vol. 936 pp. 577-579
135
weinheimer2019nuclearreflectance

Abstract

The nEXO experiment will operate an ultra-low background time projection chamber filled with 5t of isotopically enriched liquid xenon (LXe) for the search for the neutrinoless double beta decay in Xe-136. The detector will use 4m2 of silicon photomultipliers (SiPMs) operated at about −104∘C to collect the scintillation light. There are strong requirements on the background levels, light collection efficiency and SiPM performance to set the most stringent limits on the half-life. Detecting the 0νββ-decay would have wide-spread implications for neutrino physics. The SiPMs need to be sensitive to the vacuum-ultraviolet scintillation light of LXe at 178nm which is not given for off-the shelf SiPMs. The SiPM performance requirements adopted by nEXO are (among others) a photon detection efficiency of at least 15% at 178nm, a correlated avalanche probability of less than 20% and a low dark-rate. Additionally, the VUV-reflectance of the SiPM surface in LXe is an important parameter for optimal light collection and thus the energy resolution of nEXO. We present measurements with state-of-the-art VUV-sensitive SiPMs focusing on the surface VUV-reflectance in liquid xenon.

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10.1016/j.nima.2018.09.142
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