Influence of O2 partial pressure on the growth of nanostructured anatase phase TiO2 thin films prepared by DC reactive magnetron sputtering

Influence of O2 partial pressure on the growth of nanostructured anatase phase TiO2 thin films prepared by DC reactive magnetron sputtering

Susana Sério,M. E. Melo Jorge,Manuel J.P. Maneira,Yuri Nunes;Susana Sério;M. E. Melo Jorge;Manuel J.P. Maneira;Yuri Nunes;
materials chemistry and physics 2011 Vol. 126 pp. 73-81
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nunes2011materialsinfluence

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116187
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10.1016/j.matchemphys.2010.12.008
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