Research Article

Socio-Technical Drivers of Dark Pattern Resistance: Structural Equation Modeling of User Privacy Protection Behaviors on E-Commerce Platforms

29 reads
Digit. Soc. Rev., 2026, 1 (1), 9-14, doi: , ISSN 3106-8987

Abstract

Dark patterns, deceptive design practices employed on digital platforms, pose significant threats to user autonomy and privacy, particularly within the burgeoning e-commerce landscape. This study investigates the socio-technical drivers influencing user resistance to dark patterns and the subsequent adoption of privacy protection behaviors. Drawing upon the socio-technical systems theory and the privacy calculus framework, we propose a model that examines the interrelationships between perceived dark patterns, digital literacy, privacy concern, perceived self-efficacy, and dark pattern resistance behaviors. A quantitative research approach was employed, collecting data from 458 e-commerce users through an online survey. Structural Equation Modeling (SEM) was utilized to analyze the hypothesized relationships. The findings reveal that perceived dark patterns significantly heighten user privacy concern. Furthermore, digital literacy and perceived self-efficacy emerge as crucial antecedents, directly and positively influencing users' resistance to dark patterns and their engagement in privacy-protective actions. Privacy concern also plays a mediating role in this process. This research contributes to a deeper understanding of user behavior in ethically challenging digital environments, offering actionable insights for designers, policymakers, and consumer advocates aiming to foster a more transparent and user-centric digital economy.

Keywords self-efficacy digital literacy privacy protection e-commerce Dark Patterns
Authors 2

The team behind this paper

2 authors, 2 institutions.

This paper Charles University Charles University 1 author University of the Witwatersrand — South Africa University of the Witwa… 1 author Prof. Elena Rostova — corresponding author ER Prof. Elena Rostova ✉ Dr. Kwesi Adomako KA Dr. Kwesi Adomako

Readership

29 reads over 3 months.

#3 most read in this journal this month
July 2026 September 2026

Blockchain Confirmation

Loading...
If you want to upload this article to SciMatic Hybrid Blockchain, install MetaMask extension to your web browser, create a wallet and buy SCI coins at SciMatic using credit or contact your country coordinator.
One article costs 10 SCI coins to be in the Blockchain. Buy SCI Coins

Bibliographic Information

Prof. Elena Rostova, Dr. Kwesi Adomako, (2026). Socio-Technical Drivers of Dark Pattern Resistance: Structural Equation Modeling of User Privacy Protection Behaviors on E-Commerce Platforms, Digital & Social Review, 1(1): 9-14
Bibtex Citation
@article{prof._elena_rostova2026dsr,
author = {Prof. Elena Rostova and Dr. Kwesi Adomako},
title = {Socio-Technical Drivers of Dark Pattern Resistance: Structural Equation Modeling of User Privacy Protection Behaviors on E-Commerce Platforms},
journal = {Digital & Social Review},
year = {2026},
volume = {1},
number = {1},
pages = {9-14},
doi = {},
url = {https://scimatic.org/show_manuscript/8766}
}
APA Citation
Rostova, P.E., Adomako, D.K., (2026). Socio-Technical Drivers of Dark Pattern Resistance: Structural Equation Modeling of User Privacy Protection Behaviors on E-Commerce Platforms. Digital & Social Review, 1(1), 9-14. https://doi.org/

Author Information

  • To change your profile photo, login to scimatic.org, go to your profile and change the photo.
  • Provide a face photo, and not full body.
  • It is better to remove the background from your photo. Go to Remove Background and then upload to profile
  • If you are unable to login, go to Reset My Password provide your email registered with the article and get new password.
  • In case of any other problem, contact your editor directly or write to us at info @ scimatic.org