Synthetic diamond films are routinely grown using chemical vapor deposition (CVD) techniques. Due to their extraordinary combination of intrinsic properties, they are used as the functional layers in various bio-optoelectronic devices. It is a challenge to grow the dimensional layers or porous structures that are required. This study reviews the fabrication of various porous diamond-based structures using linear antenna microwave plasma (LAMWP) chemical vapor deposition (CVD), a low-cost technology for growing diamond films over a large area (>1 m) at low pressure (<100 Pa) and at low temperature (even at 350 °C). From a technological point of view, two different approaches, i.e., templated diamond growth using three different prestructured (macro-, micro-, and nanosized) porous substrates and direct bottom-up growth of ultra-nanoporous diamond (block-stone and dendritelike) films, are successfully employed to form diamond-based structures with controlled porosity and an enhanced surface area. As a bottom-up strategy, the LAMWP CVD system allows diamond growth at as high as 80% CO in the CH/CO/H gas mixture. In summary, the low-pressure and cold plasma conditions in the LAMWP system facilitate the growth on three-dimensionally prestructured substrates of various materials that naturally form porous self-standing diamond structures.