Intensively evaporating liquid films moving under the action of the cocurrent gas flow in a microchannel are promising for the use in modern cooling systems of semiconductor devices with high local heat release. This work has studied the dependence of the critical heat flux on the inclination angle of the channel. It has been found that the inclination angle in the plane parallel to the flow has no significant effect on the critical heat flux. Whereas the inclination angle in the plane perpendicular to the flow, on the contrary, significantly changes the value of the critical heat flux. However, for a given flow rate of fluid there is a threshold gas velocity at which the critical heat flux does not differ from the case of zero inclination of the channel. Thus, it can be concluded that the cooling system based on shear-driven liquid films can be potentially used when direction of the gravity changes.