low-loss slot waveguides with silicon (111) surfaces realized using anisotropic wet etching

low-loss slot waveguides with silicon (111) surfaces realized using anisotropic wet etching

;Kapil Debnath;Ali Z Khokhar;Stuart A Boden;Hideo Arimoto;Swe Zin Oo;Harold M H Chong;Graham Trevor Reed;Shinichi Saito
International journal of infectious diseases : IJID : official publication of the International Society for Infectious Diseases 2016 Vol. 3 pp. -
164
debnath2016frontierslow-loss

Abstract

We demonstrate low-loss slot waveguides on silicon-on-insulator (SOI) platform. Waveguides oriented along the (11-2) direction on the Si (110) plane were first fabricated by a standard e-beam lithography and dry etching process. A TMAH based anisotropic wet etching technique was then used to remove any residual side wall roughness. Using this fabrication technique propagation loss as low as 3.7dB/cm was realized in silicon slot waveguide for wavelengths near 1550nm. We also realized low propagation loss of 1dB/cm for silicon strip waveguides.

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0x95644003c57E6F55A65596E3D9Eac6813e3566dA
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143790
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10.3389/fmats.2016.00051
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